• Department of Cardiovascular Surgery, Pediatric Heart Center, West China Hospital, Sichuan University, Chengdu 610041, P. R. China;
ANQi, Email: anqi8890@163.com
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Doubly committed sub-arterial ventricular septal defect (VSD) is a unique type of VSD which is located beneath both the aortic and pulmonary valve. Open-heart repair is traumatic especially for pediatric patient while trans-catheter device closure is also not suitable for this type of VSD. Minimally invasive per-ventricular device closure has been introduced as an alternative method in the treatment of doubly committed VSD with encouraging results. In the review, we will illustrate the surgical technique as well as perioperative management strategy as for this technique in treating doubly committed VSD.

Citation: CHENMiao, ZHUDa, ANQi. Per-ventricular Device Closure of Doubly Committed Sub-arterial Ventricular Septal Defect ——Technical Consideration and Perioperative Management. Chinese Journal of Clinical Thoracic and Cardiovascular Surgery, 2015, 22(6): 596-601. doi: 10.7507/1007-4848.20150150 Copy

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